The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2024
Filed:
May. 14, 2021
Applicant:
Up Chemical Co., Ltd., Pyeongtaek-si, KR;
Inventors:
Jin Sik Kim, Pyeongtaek-si, KR;
Myeong Ho Kim, Cheonan-si, KR;
Mi Hee Lee, Daegu, KR;
Byung Kwan Kim, Pyeongtaek-si, KR;
Jun Hwan Choi, Goyang-si, KR;
Sungwoo Ahn, Yangju-si, KR;
Yun Gyeong Yi, Guri-si, KR;
Assignee:
UP CHEMICAL CO., LTD., Pyeongtaek-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07F 7/10 (2006.01); C23C 16/24 (2006.01); C23C 16/32 (2006.01); C23C 16/34 (2006.01); C23C 16/40 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C07F 7/10 (2013.01); C23C 16/24 (2013.01); C23C 16/325 (2013.01); C23C 16/345 (2013.01); C23C 16/401 (2013.01); C23C 16/45536 (2013.01); C23C 16/45553 (2013.01);
Abstract
The present application relates to a silicon precursor compound, a method for preparing the silicon precursor compound, a precursor composition for depositing a silicon-containing oxide thin film or nitride thin film, the precursor composition comprising the silicon precursor compound, and a method for depositing a silicon-containing oxide thin film or nitride thin film using the precursor composition.