The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2024
Filed:
Mar. 27, 2020
Canon Kabushiki Kaisha, Tokyo, JP;
Tatsuya Hayashi, Utsunomiya, JP;
Tomomi Funayoshi, Utsunomiya, JP;
Kenichi Kobayashi, Utsunomiya, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
An imprint apparatus that forms a pattern of an imprint material on a substrate by using a mold includes a mold holder that holds the mold and an optical system that irradiates the imprint material on the substrate with irradiation light for increasing a viscosity of the imprint material. The irradiation light has a light intensity distribution such that a light intensity increases from a center of a pattern portion of the mold toward a side surface of the pattern portion when the mold is held by the mold holder. The imprint material that moves from the center of the pattern portion of the mold toward the side surface of the pattern portion in a region including the side surface of the pattern portion of the mold is irradiated with the irradiation light while the mold and the imprint material on the substrate are in contact with each other.