The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 20, 2024

Filed:

Jul. 09, 2021
Applicant:

Lg Chem, Ltd., Seoul, KR;

Inventors:

Moon Sub Hwang, Daejeon, KR;

Min Ho Sun, Daejeon, KR;

Jong Hun Song, Daejeon, KR;

Kyung Seog Youk, Daejeon, KR;

Jeong Seok Lee, Daejeon, KR;

Hong Min Lee, Daejeon, KR;

Assignee:

LG Chem, Ltd., Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 19/26 (2006.01); B01J 4/00 (2006.01); B01J 10/00 (2006.01); C07C 2/08 (2006.01);
U.S. Cl.
CPC ...
B01J 19/26 (2013.01); B01J 4/002 (2013.01); B01J 10/00 (2013.01); C07C 2/08 (2013.01); B01J 2204/002 (2013.01);
Abstract

The present disclosure relates to an apparatus for preparing an oligomer, and more particularly, to an apparatus for preparing an oligomer including: a reactor including a gaseous area having a first gaseous reactant inlet provided at a lower portion thereof, and a reaction area in which a reaction medium reacts with the gaseous reactant above the gaseous area; a second gaseous reactant inlet provided on an inner wall of the reactor in the gaseous area and a third gaseous reactant inlet provided on an inner wall of the reactor facing the second gaseous reactant inlet; and a first injection nozzle connected to the second gaseous reactant inlet and a second injection nozzle connected to the third gaseous reactant inlet.


Find Patent Forward Citations

Loading…