The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2024
Filed:
Nov. 20, 2018
3m Innovative Properties Company, St. Paul, MN (US);
Saswata Chakraborty, Cottage Grove, MN (US);
Benjamin C. MacMurray, St. Paul, MN (US);
Eric W. Nelson, Stillwater, MN (US);
Thomas P. Klun, Lakeland, MN (US);
Richard J. Pokorny, Maplewood, MN (US);
Wayne S. Mahoney, St. Paul, MN (US);
Chad M. Amb, Roberts, WI (US);
George W. Griesgraber, Eagan, MN (US);
Dana R. Reed, Minneapolis, MN (US);
Ahmed S. Abuelyaman, Woodbury, MN (US);
Robert S. Clough, St. Paul, MN (US);
James D. Hansen, White Bear Lake, MN (US);
Daniel J. Skamser, Ham Lake, MN (US);
Ian Dailey, Maplewood, MN (US);
John M. Riedesel, San Jose, CA (US);
3M Innovative Properties Company, St. Paul, MN (US);
Abstract
An orthodontic article is described comprising the reaction product of a free-radically polymerizable resin; a first free-radical photoinitiator having sufficient absorbance at a first wavelength range; and a second free-radical initiator selected from a second photoinitiator having sufficient absorbance at a second wavelength range, wherein the second wavelength range is different than the first wavelength range, or a thermal free-radical initiator. In some embodiments, the first free-radical photoinitiator exhibits a maximum absorbance at a wavelength of the range of 370-380 nm or 320-330 nm and/or comprises photoinitiator groups selected from acyl phosphine oxide or alkyl amine acetophenone. Also described are photopolymerizable compositions and methods.