The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 20, 2024

Filed:

Aug. 19, 2021
Applicant:

Olympus Corporation, Tokyo, JP;

Inventors:

Ikutoshi Fukushima, Tokyo, JP;

Atsuyoshi Shimamoto, Tokyo, JP;

Mitsuru Namiki, Tokyo, JP;

Assignee:

OLYMPUS CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61B 18/26 (2006.01); A61B 90/00 (2016.01); A61B 18/00 (2006.01);
U.S. Cl.
CPC ...
A61B 18/26 (2013.01); A61B 90/06 (2016.02); A61B 2018/00505 (2013.01); A61B 2018/00982 (2013.01); A61B 2090/061 (2016.02);
Abstract

A lithotripsy apparatus includes: a treatment laser beam source that emits a treatment laser beam that crushes a stone; a guide light source that emits guide light; a photodetector that detects return light that returns as a result of the emitted guide light being reflected at the stone; and a processor including hardware, the processor being configured to: measure a distance from the treatment laser beam source to the stone on the basis of the return light; determine a condition of a bubble occurring between the treatment laser beam source and the stone on the basis of the measured distance; and adjust a light quantity of the treatment laser beam on the basis of the determined condition of the bubble.


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