The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 13, 2024

Filed:

May. 10, 2021
Applicant:

Samsung Display Co., Ltd., Yongin-si, KR;

Inventors:

Dae Hwan Jang, Yongin-si, KR;

Jae Been Lee, Yongin-si, KR;

Jin Ho Cho, Yongin-si, KR;

Assignee:

SAMSUNG DISPLAY CO., LTD, Yongin-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10K 59/121 (2023.01); H10K 50/844 (2023.01); H10K 59/38 (2023.01); H10K 59/131 (2023.01); H10K 71/00 (2023.01); H10K 59/12 (2023.01);
U.S. Cl.
CPC ...
H10K 59/121 (2023.02); H10K 50/844 (2023.02); H10K 59/131 (2023.02); H10K 59/38 (2023.02); H10K 71/00 (2023.02); H10K 59/1201 (2023.02);
Abstract

A display device includes a base layer including a first surface and a second surface, pixels and first lines that are disposed on the first surface, second lines disposed on the second surface and corresponding to the first lines, a multi-layered etch stopper layer disposed on the first surface and disposed between the base layer and the first lines, and via holes penetrating the base layer and the multi-layered etch stopper layer, the via holes connecting the first lines to the second lines. The multi-layered etch stopper layer includes a first etch stopper layer disposed on the first surface and surrounding each of the via holes, the first etch stopper layer including an inorganic layer, and a second etch stopper layer entirely disposed on the first surface including the first etch stopper layer, the second etch stopper layer being open in a region corresponding to the via holes.


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