The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 13, 2024

Filed:

Nov. 25, 2015
Applicant:

Shin-etsu Chemical Co., Ltd., Tokyo, JP;

Inventors:

Hiroyuki Otsuka, Karuizawa-machi, JP;

Shozo Shirai, Takasaki, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/18 (2006.01); H01L 21/22 (2006.01); H01L 21/324 (2006.01); H01L 31/068 (2012.01); C30B 31/18 (2006.01); C30B 29/06 (2006.01); C30B 31/08 (2006.01); C30B 33/02 (2006.01); H01L 31/0288 (2006.01);
U.S. Cl.
CPC ...
H01L 31/1804 (2013.01); C30B 29/06 (2013.01); C30B 31/08 (2013.01); C30B 31/185 (2013.01); C30B 33/02 (2013.01); H01L 21/22 (2013.01); H01L 21/324 (2013.01); H01L 31/0288 (2013.01); H01L 31/068 (2013.01); H01L 31/1864 (2013.01); Y02E 10/547 (2013.01); Y02P 70/50 (2015.11);
Abstract

The present invention is a method for manufacturing a substrate for a solar cell composed of a single crystal silicon, including the steps of: producing a silicon single crystal ingot; slicing a silicon substrate from the silicon single crystal ingot; and subjecting the silicon substrate to low temperature thermal treatment at a temperature of 800° C. or more and less than 1200° C., wherein the silicon single crystal ingot or the silicon substrate is subjected to high temperature thermal treatment at a temperature of 1200° C. or more for 30 seconds or more before the low temperature thermal treatment. As a result, it is possible to provide a method for manufacturing a substrate for a solar cell that can prevent decrease in the minority carrier lifetime of the substrate even when the substrate has higher oxygen concentration.


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