The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 13, 2024

Filed:

Oct. 22, 2021
Applicant:

Tencent Technology (Shenzhen) Company Limited, Shenzhen, CN;

Inventors:

Xiangkai Lin, Shenzhen, CN;

Linchao Bao, Shenzhen, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 19/20 (2011.01); G06T 7/30 (2017.01); G06T 17/20 (2006.01);
U.S. Cl.
CPC ...
G06T 19/20 (2013.01); G06T 7/30 (2017.01); G06T 17/20 (2013.01); G06T 2207/30201 (2013.01); G06T 2219/2004 (2013.01); G06T 2219/2021 (2013.01);
Abstract

A three-dimensional face model generation method is provided. The method includes: obtaining an inputted three-dimensional face mesh of a target object; aligning the three-dimensional face mesh with a first three-dimensional face model of a standard object according to face keypoints; performing fitting on the three-dimensional face mesh and a local area of the first three-dimensional face model, to obtain a second three-dimensional face model after local fitting; and performing fitting on the three-dimensional face mesh and a global area of the second three-dimensional face model, to obtain a three-dimensional face model of the target object after global fitting.


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