The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 13, 2024
Filed:
Dec. 19, 2022
Canon Kabushiki Kaisha, Tokyo, JP;
Yosuke Murakami, Tochigi, JP;
Kazuki Nakagawa, Tochigi, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
An imprint apparatus performs an imprint process including aligning a substrate and a mold in a state in which the mold is in contact with an imprint material on the substrate and curing the imprint material by light irradiation after the aligning. The apparatus includes a first irradiation unit configured to perform first light irradiation of the imprint material on the substrate before bringing the mold into contact with the imprint material on the substrate for the aligning, a second irradiation unit configured to perform second light irradiation of the imprint material on the substrate in the aligning, and a third irradiation unit configured to perform third light irradiation of the imprint material on the substrate in the curing, wherein an exposure amount by the first light irradiation is determined based on an exposure amount by the second light irradiation.