The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 13, 2024
Filed:
Oct. 20, 2021
Applicant:
National Taiwan University, Taipei, TW;
Inventors:
Assignee:
NATIONAL TAIWAN UNIVERSITY, Taipei, TW;
Primary Examiner:
Int. Cl.
CPC ...
G02B 21/36 (2006.01); G06T 7/00 (2017.01); G02B 21/00 (2006.01); G06N 3/045 (2023.01);
U.S. Cl.
CPC ...
G02B 21/367 (2013.01); G02B 21/0064 (2013.01); G06N 3/045 (2023.01); G06T 7/0012 (2013.01); G06T 2207/10056 (2013.01); G06T 2207/20081 (2013.01); G06T 2207/30096 (2013.01);
Abstract
A margin assessment method is provided. Under cooperation of harmonic generation microscopy (HGM) and a deep learning method, the margin assessment method can instantaneously and digitally determine whether a 3D image group generated by an HGM imaging system is a malignant tumor or the surrounding normal skin, so as to assist in determining margins of a lesion.