The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 13, 2024

Filed:

Oct. 08, 2021
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Jooho Lee, Hwaseong-si, KR;

Yongsung Kim, Suwon-si, KR;

Sanghoon Song, Hwaseong-si, KR;

Wooyoung Yang, Hwaseong-si, KR;

Changseung Lee, Yongin-si, KR;

Sungjin Lim, Suwon-si, KR;

Junsik Hwang, Hwaseong-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/34 (2006.01); C23C 16/50 (2006.01); C23C 16/06 (2006.01); C23C 16/44 (2006.01); H01M 4/04 (2006.01); H01M 10/052 (2010.01); H01J 37/32 (2006.01); H01M 16/00 (2006.01); C23C 16/00 (2006.01);
U.S. Cl.
CPC ...
C23C 16/34 (2013.01); C23C 16/00 (2013.01); C23C 16/06 (2013.01); C23C 16/4408 (2013.01); C23C 16/50 (2013.01); H01J 37/32 (2013.01); H01J 37/3244 (2013.01); H01M 4/0428 (2013.01); H01M 10/052 (2013.01); H01M 16/00 (2013.01); H01J 2237/3321 (2013.01); H01M 2220/30 (2013.01); H01M 2300/0068 (2013.01);
Abstract

A method of forming a lithium (Li)-based film, may include: supplying a Li source material into a reaction chamber in which a substrate is disposed; supplying phosphor (P) and oxygen (O) source materials and a nitrogen (N) source material into the reaction chamber; and generating plasma in the reaction chamber to form a Li-based film on the substrate from the Li, P, O, and N source materials, wherein the supplying of the Li source material into the reaction chamber and the supplying of the P and O source materials and the N source material into the reaction chamber are performed with a time interval, and wherein the Li source material supplied into the reaction chamber is deposited on the substrate, and the P and O source materials supplied into the reaction chamber are adsorbed on the Li source material.


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