The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 13, 2024
Filed:
Jul. 27, 2018
Applicant:
Daikin Industries, Ltd., Osaka, JP;
Inventor:
Yoshiaki Honda, Osaka, JP;
Assignee:
DAIKIN INDUSTRIES, LTD., Osaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 65/336 (2006.01); C23C 14/04 (2006.01); C23C 14/24 (2006.01); C23C 14/18 (2006.01); C23C 14/35 (2006.01); H05K 3/14 (2006.01); H05K 1/03 (2006.01);
U.S. Cl.
CPC ...
C08G 65/336 (2013.01); C23C 14/042 (2013.01); C23C 14/18 (2013.01); C23C 14/24 (2013.01); C23C 14/35 (2013.01); H05K 1/034 (2013.01); H05K 3/143 (2013.01);
Abstract
A substrate for pattern formation, the substrate including at least a base material and a perfluoro(poly)ether group-containing silane compound-derived portion, wherein the base material includes at least one main face having a first region and a second region which is a region for pattern formation, adjacent to the first region, and the perfluoro(poly)ether group-containing silane compound-derived portion is disposed in the first region.
Honda, Yoshiaki. (2024). Substrate for pattern formation (U.S. Patent No. 11898008). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11898008
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile