The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 13, 2024

Filed:

Oct. 04, 2019
Applicants:

Commissariat a L'energie Atomique ET Aux Energies Alternatives, Paris, FR;

Centre National DE LA Recherche Scientifique—cnrs—, Paris, FR;

Inventors:

Clarisse Tran, Paris, FR;

Thu-Hoa Tran-Thi, Montrouge, FR;

Sabine Crunaire, Douai, FR;

Jean-Luc Wojkiewicz, Douai, FR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C01B 33/155 (2006.01); B01J 20/10 (2006.01); B01J 20/28 (2006.01); C01B 33/158 (2006.01);
U.S. Cl.
CPC ...
C01B 33/155 (2013.01); B01J 20/103 (2013.01); B01J 20/28047 (2013.01); C01B 33/158 (2013.01);
Abstract

A method for preparing a monolithic nanoporous silicate sol-gel material for modulating the pore size distribution for one single starting composition without the addition of a structuring agent. The method includes the following steps: a) synthesising a gel from at least one organosilylated precursor, the synthesis being carried out in an aqueous medium, optionally including an organic solvent and without a structuring agent, and b) drying the gel obtained in step a) at a temperature between 10° C. and 70° C., preferably between 15° C. and 55° C. and more preferably between 20° C. and 40° C., in a gas flow in a drying chamber to obtain a monolithic nanoporous silicate sol-gel material and a residual relative humidity in the drying chamber of between 0.1 and 20%, preferably between 0.5 and 10% and more preferably about 5%.


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