The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 13, 2024
Filed:
Jun. 12, 2020
Ams Sensors Singapore Pte. Ltd., Singapore, SG;
Uros Markovic, Zurich, CH;
Nicola Spring, Ziegelbrücke, CH;
ams Sensors Singapore Pte. Ltd., Singapore, SG;
Abstract
Techniques for controlling the flow of replication material (e.g., epoxy) during the formation of replicated optical elements include providing a transparent substrate () onto which the optical elements are to be replicated. The substrate () includes a structured UV curable shield () adhering to its surface. The UV curable shield (), in turn, has openings () that expose portions of the surface of the transparent substrate () for replication of the optical elements. During the replication process, excess replication material (A) may flow onto the UV curable shield (), which subsequently can be cured so as to facilitate the release and removal of the shield () along with the excess replication material (A).