The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 13, 2024

Filed:

Sep. 03, 2019
Applicant:

Elemental Scientific, Inc., Omaha, NE (US);

Inventors:

Daniel R. Wiederin, Omaha, NE (US);

Kevin Wiederin, Omaha, NE (US);

Assignee:

Elemental Scientific, Inc., Omaha, NE (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B05B 7/00 (2006.01); H01J 49/10 (2006.01); H01J 49/04 (2006.01); G01N 30/04 (2006.01); H01J 49/00 (2006.01); G05D 7/00 (2006.01); G05D 21/00 (2006.01);
U.S. Cl.
CPC ...
B05B 7/0012 (2013.01); G01N 30/04 (2013.01); G05D 7/00 (2013.01); G05D 21/00 (2013.01); H01J 49/0045 (2013.01); H01J 49/045 (2013.01); H01J 49/105 (2013.01);
Abstract

Systems and methods are described for automatically adjusting the composition of a spray chamber matrix gas flow coordinated with an analysis of a particular chemical element or groups of elements. A system can include a spray chamber configured to be coupled to an analytical system, the spray chamber having a nebulizer gas port configured to receive a nebulizer gas; and an inlet for receiving a gas from at least one gas source. The system also includes a controller operably coupled to the spray chamber, the controller configured to adjust a gas flow rate of the gas from the at least one gas source in coordination with analysis of a particular chemical element by the analytical system.


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