The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 06, 2024
Filed:
Nov. 25, 2019
Chengdu Boe Optoelectronics Technology Co., Ltd., Sichuan, CN;
Boe Technology Group Co., Ltd., Beijing, CN;
Erlong Song, Beijing, CN;
Chaoxin Yun, Beijing, CN;
Wenbo Hu, Beijing, CN;
Shun Zhang, Beijing, CN;
Zhengwei Luo, Beijing, CN;
Huijie Meng, Beijing, CN;
Yongkang Zhang, Beijing, CN;
CHENGDU BOE OPTOELECTRONICS TECHNOLOGY CO., LTD., Sichuan, CN;
BOE TECHNOLOGY GROUP CO., LTD., Beijing, CN;
Abstract
The present disclosure provides a display substrate and a method for manufacturing the same and a display device. The display substrate includes: an array of sub-pixels, a signal line and a first retaining wall structure. A first conductive pattern of the signal line is between a base substrate and a second conductive pattern of the signal line. An orthographic projection of a second portion of the first retaining wall structure on the base substrate partially overlaps an orthographic projection of the first conductive pattern on the base substrate; a boundary of the orthographic projection of the second portion on the base substrate distal to the array of sub-pixels, is between the array of sub-pixels and a boundary of the orthographic projection of the first conductive pattern on the base substrate distal to the array of sub-pixels. The orthographic projection of the second portion on the base substrate partially overlaps the orthographic projection of the second conductive pattern on the base substrate; a boundary of the orthographic projection of the second conductive pattern on the base substrate close to the array of sub-pixels, is between the array of sub-pixels and a boundary of the orthographic projection of the second portion on the base substrate, close to the array of sub-pixels.