The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 06, 2024

Filed:

Sep. 11, 2019
Applicant:

Sumitomo Precision Products Co., Ltd., Amagasaki, JP;

Inventor:

Yasuyuki Hirata, Amagasaki, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 14/04 (2006.01); C23C 14/22 (2006.01); C23C 14/02 (2006.01); H05K 3/12 (2006.01); C23C 14/34 (2006.01); C23C 16/30 (2006.01);
U.S. Cl.
CPC ...
H05K 3/1216 (2013.01); C23C 14/021 (2013.01); C23C 14/042 (2013.01); C23C 14/225 (2013.01); C23C 14/34 (2013.01); C23C 16/308 (2013.01);
Abstract

The method for processing a substrate includes the substrate preparation step of preparing the substrate, the pattern formation step of forming dummy patterns extending in an X-direction on the substrate, the mask arrangement step of arranging a stencil mask having multiple opening patterns on the substrate, the coating formation step of forming a metal film on the substrate through the multiple opening patterns, and the separation step of separating the dummy patterns from the substrate to obtain a submount. The dummy pattern has protrusion formed such that a side surface of the submount is exposed and formed close to the side surface with a clearance.


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