The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 06, 2024
Filed:
Jul. 14, 2021
Laser annealing apparatus, laser annealing method, and method for manufacturing semiconductor device
Jsw Aktina System Co., Ltd., Yokohama, JP;
Kenichi Ohmori, Shinagawa-ku, JP;
Suk-Hwan Chung, Shinagawa-ku, JP;
Ryosuke Sato, Shinagawa-ku, JP;
Nobuo Oku, Shinagawa-ku, JP;
JSW AKTINA SYSTEM CO., LTD., Yokohama, JP;
Abstract
A laser annealing apparatus according to an embodiment includes a laser light source, an annealing optical system, a linear irradiation region along a Y-direction, a moving mechanism configured to change a relative position of the irradiation region with respect to the substrate along an X-direction, an illumination light source configured to generate illumination light for illuminating the substrate along a third direction, and a detector configured to detect detection light reflected, in a fourth direction, on the substrate illuminated by the illumination light so as to photograph an annealed part of the substrate in a linear field of view along the Y-direction. In a YZ-plane view, the third direction is inclined from the vertical direction and the fourth direction is inclined from the vertical direction.