The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 06, 2024

Filed:

May. 23, 2019
Applicant:

Jx Metals Corporation, Tokyo, JP;

Inventors:

Yasuyuki Iwabuchi, Ibaraki, JP;

Manami Masuda, Ibaraki, JP;

Takashi Kosho, Ibaraki, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/34 (2006.01); C23C 14/34 (2006.01); C22C 19/07 (2006.01); H01F 41/18 (2006.01); H01F 10/16 (2006.01); G11B 5/65 (2006.01); G11B 5/851 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3429 (2013.01); C22C 19/07 (2013.01); C23C 14/3414 (2013.01); G11B 5/656 (2013.01); G11B 5/658 (2021.05); G11B 5/851 (2013.01); H01F 10/16 (2013.01); H01F 41/183 (2013.01);
Abstract

Provided is a sputtering target, comprising: from 0.001 mol % to 0.5 mol % of Bi; from 45 mol % or less of Cr; 45 mol % or less of Pt; 60 mol % or less of Ru; and a total of 1 mol % to 35 mol % of at least one metal oxide, the balance being Co and inevitable impurities.


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