The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 06, 2024

Filed:

Jul. 22, 2022
Applicant:

Semes Co., Ltd., Chungcheongnam-do, KR;

Inventor:

Je Ho Kim, Yongin-si, KR;

Assignee:

SEMES CO., LTD., Chungcheongnam-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01L 21/683 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3288 (2013.01); H01J 37/3244 (2013.01); H01J 37/32642 (2013.01); H01J 37/32697 (2013.01); H01J 37/32724 (2013.01); H01L 21/67069 (2013.01); H01L 21/67288 (2013.01); H01L 21/6833 (2013.01); H01J 37/3211 (2013.01); H01J 2237/002 (2013.01); H01J 2237/24585 (2013.01); H01J 2237/334 (2013.01);
Abstract

The inventive concept relates to an apparatus and a method for processing a substrate. In an embodiment, the apparatus includes a process chamber having a processing space inside, a support unit that supports the substrate in the processing space, a gas supply unit that supplies a process gas into the processing space, and a plasma source that generates plasma from the process gas. The support unit includes a support on which the substrate is placed, an edge ring around the substrate placed on the support, an impedance adjustment member provided below the edge ring, and a temperature adjustment member that variably adjusts temperature of the impedance adjustment member.


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