The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 06, 2024
Filed:
Jun. 22, 2018
Applicant:
Hitachi High-tech Corporation, Tokyo, JP;
Inventors:
Asako Kaneko, Tokyo, JP;
Hisayuki Takasu, Tokyo, JP;
Assignee:
Hitachi High-Tech Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/20 (2006.01); H01J 37/08 (2006.01); H01J 37/09 (2006.01); H01J 37/147 (2006.01); H01J 37/305 (2006.01);
U.S. Cl.
CPC ...
H01J 37/20 (2013.01); H01J 37/08 (2013.01); H01J 37/09 (2013.01); H01J 37/1478 (2013.01); H01J 37/3053 (2013.01); H01J 2237/002 (2013.01); H01J 2237/1502 (2013.01); H01J 2237/20214 (2013.01);
Abstract
An ion milling device capable of high-speed milling is realized even for a specimen containing a material having an imide bond. Therefore, the ion milling device includes: a vacuum chamberconfigured to hold a specimenin a vacuum atmosphere; an ion gunconfigured to irradiate the specimen with a non-focused ion beam; a vaporization containerconfigured to store a mixed solutionof a water-soluble ionic liquid and water; and nozzlesconfigured to supply water vapor obtained by vaporizing the mixed solution to a vicinity of a surface of the specimen processed by the ion beam.