The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 06, 2024

Filed:

Nov. 18, 2022
Applicant:

Bio-rad Laboratories, Inc., Hercules, CA (US);

Inventors:

Amir Sadri, Toronto, CA;

Nenad Kircanski, Toronto, CA;

Thanh-Vi Tran, Scarborough, CA;

Carl Marlowe, San Francisco, CA (US);

Brian David Wilson, Pleasant Hill, CA (US);

Assignee:

Bio-Rad Laboratories, Inc., Hercules, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F25B 21/04 (2006.01); B01L 7/00 (2006.01); H10N 10/10 (2023.01); H10N 10/80 (2023.01);
U.S. Cl.
CPC ...
F25B 21/04 (2013.01); B01L 7/00 (2013.01); B01L 7/52 (2013.01); H10N 10/10 (2023.02); H10N 10/80 (2023.02); B01L 2300/08 (2013.01); B01L 2300/123 (2013.01); B01L 2300/1805 (2013.01);
Abstract

A heat pump that includes a thermoelectric device(s) and a heat sink having a raised portion with a top surface for thermally coupling with a planar face of the thermoelectric device(s). The raised portion of the heat sink includes an outer periphery and a raised central region surrounded by a void region to provide more uniform thermal conductivity when clamped within an assembly. The raised central region is shaped in an any shape corresponding to a shape of uneven thermal conductivity due to clamping pressure applied to the heat sink. The void region can be substantially contiguous and entirely circumscribe the central raised region. The device can optionally include discrete supports formed of a less thermally-conductive material within the void region. The supports can be elastomeric, such as O-rings, and disposed within pockets defined within the void region.


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