The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 06, 2024

Filed:

Aug. 11, 2020
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Feng Q. Liu, San Jose, CA (US);

Alexander Jansen, San Jose, CA (US);

Mark Saly, Santa Clara, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/18 (2006.01); C23C 16/455 (2006.01); H01L 21/285 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C23C 16/18 (2013.01); C23C 16/45527 (2013.01); C23C 16/45553 (2013.01); H01L 21/0234 (2013.01); H01L 21/02175 (2013.01); H01L 21/02205 (2013.01); H01L 21/28568 (2013.01);
Abstract

A method of forming a molybdenum film by oxidation and reduction is disclosed. A molybdenum oxide film is formed by CVD or ALD using a halide free organometallic molybdenum precursor. The molybdenum oxide film contains low amounts of carbon impurities. The molybdenum oxide film is reduced to form a highly pure molybdenum film. The molybdenum film has low resistance and properties similar to bulk molybdenum.


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