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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11891214 B1

PDFFull Text
Date of Patent:
Feb. 06, 2024

Filed:

Jul. 13, 2020

Films and bags having gradient deformation patterns

Applicant:

The Glad Products Company, Oakland, CA (US);

Inventors:

Edward B Tucker, Willowbrook, IL (US);

Robert T Dorsey, Willowbrook, IL (US);

Ranyi Zhu, Willowbrook, IL (US);

Theodore Cory Fites, Pleasanton, CA (US);

Zeljko Vidovic, Willowbrook, IL (US);

Michael G Borchardt, Willowbrook, IL (US);

Jason R Maxwell, Willowbrook, IL (US);

Shaun T Broering, Fort Thomas, KY (US);

Daniel C Peck, West Chester, OH (US);

Assignee:

The Glad Products Company, Oakland, CA (US);

Attorney:

Keller Preece PLLC

Primary Examiner:

Derek J Battisti

Int. Cl.
CPC ...
B65D 33/02 (2006.01); B29C 59/02 (2006.01); B29C 59/04 (2006.01); B32B 1/00 (2006.01); B32B 3/30 (2006.01); B32B 7/14 (2006.01); B32B 27/08 (2006.01); B65D 33/28 (2006.01); B65F 1/00 (2006.01); B29K 101/12 (2006.01); B29L 31/00 (2006.01);
U.S. Cl.
CPC ...
B65D 33/02 (2013.01); B29C 59/022 (2013.01); B29C 59/04 (2013.01); B32B 1/00 (2013.01); B32B 3/30 (2013.01); B32B 7/14 (2013.01); B32B 27/08 (2013.01); B65D 33/28 (2013.01); B65F 1/0006 (2013.01); B29K 2101/12 (2013.01); B29L 2031/7129 (2013.01); B32B 2439/06 (2013.01);
Abstract

Thermoplastic films and bags include gradient patterns of post-formation deformations. The gradient patterns of post-formation deformations can provide a connotation of strength. Additionally, the gradient pattern of post-formation deformations can provide different areas of the films or bags with different physical characteristics such as tear resistance, puncture resistance, elasticity, etc.

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