The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 30, 2024
Filed:
Aug. 26, 2021
Tae Technologies, Inc., Foothill Ranch, CA (US);
Gregory Luke Snitchler, Foothill Ranch, CA (US);
Shahyar Ziaei, Ladera Ranch, CA (US);
Harrison Beam Eggers, Pendleton, SC (US);
Alejandro Mesa Dame, Eden Prairie, MN (US);
TAE Technologies, Inc., Foothill Ranch, CA (US);
Abstract
Embodiments of systems, devices, and methods relate to selecting a raster profile for scanning a proton beam across a target. A raster profile is selected from among the plurality of plurality of possible raster profiles based on a value of a figure of merit. A beam is directed across the target surface to form a pattern that is repeated one or more times at different radial orientations to form a scanning profile. A target temperature is monitored while scanning the beam across the target surface according to the scanning profile. The scanning parameters are changeable to avoid target damaging, to improve thermal performance and to optimize particle loading.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile