The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 30, 2024
Filed:
Sep. 29, 2021
Sony Semiconductor Solutions Corporation, Kanagawa, JP;
Tetsuya Uchida, Kanagawa, JP;
Ryoji Suzuki, Kanagawa, JP;
Hisahiro Ansai, Kanagawa, JP;
Yoichi Ueda, Kanagawa, JP;
Shinichi Yoshida, Kanagawa, JP;
Yukari Takeya, Kanagawa, JP;
Tomoyuki Hirano, Kanagawa, JP;
Hiroyuki Mori, Kanagawa, JP;
Hirotoshi Nomura, Kanagawa, JP;
Yoshiharu Kudoh, Kanagawa, JP;
Masashi Ohura, Tokyo, JP;
Shin Iwabuchi, Kanagawa, JP;
Sony Semiconductor Solutions Corporation, Kanagawa, JP;
Abstract
There is provided a imaging device including: an N-type region formed for each pixel and configured to perform photoelectric conversion; an inter-pixel light-shielding wall penetrating a semiconductor substrate in a depth direction and formed between N-type regions configured to perform the photoelectric conversion, the N-type regions each being formed for each of pixels adjacent to each other; a P-type layer formed between the N-type region configured to perform the photoelectric conversion and the inter-pixel light-shielding wall; and a P-type region adjacent to the P-type layer and formed between the N-type region and an interface on a side of a light incident surface of the semiconductor substrate.