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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11887873 B1

PDFFull Text
Date of Patent:
Jan. 30, 2024

Filed:

Mar. 18, 2020

Wafer placement apparatus

Applicant:

Ngk Insulators, Ltd., Nagoya, JP;

Inventors:

Keita Mine, Handa, JP;

Takumi Wakisaka, Takahama, JP;

Assignee:

NGK INSULATORS, LTD., Nagoya, JP;

Attorney:

BURR PATENT LAW, PLLC

Primary Examiner:

Jeffrie R Lund

Assistant Examiner:

Tiffany Z Nuckols

Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/673 (2006.01); H01L 21/683 (2006.01); H01B 3/28 (2006.01); H05B 3/28 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67109 (2013.01); H01L 21/673 (2013.01); H01L 21/6833 (2013.01); H01L 21/6835 (2013.01); H05B 3/283 (2013.01); H05B 2203/016 (2013.01); H05B 2203/017 (2013.01);
Abstract

A wafer placement apparatus includes a ceramic plate having an upper surface as a wafer placement surface and in which an electrode is embedded; and a cooling plate provided on a lower surface, opposite a wafer placement surface, of a ceramic plate and in which a refrigerant passage is provided, wherein a refrigerant passage includes a first passage forming a single continuous line and extending parallel to a wafer placement surface, and a second passage forming a single continuous line and extending along a first passage, an outlet of a second passage being positioned near an inlet of a first passage, an inlet of a second passage being positioned near an outlet of a first passage.

Find Patent Forward Citations

Mine, Keita. (2024). Wafer placement apparatus (U.S. Patent No. 11887873). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11887873

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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