The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 30, 2024

Filed:

Feb. 16, 2022
Applicant:

GM Global Technology Operations Llc, Detroit, MI (US);

Inventors:

Oren Longman, Tel Aviv, IL;

Noam Zac, Kfar Saba, IL;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01S 17/89 (2020.01); G06T 3/00 (2006.01); G01S 13/89 (2006.01); G01S 17/931 (2020.01); G01S 13/931 (2020.01); G06T 7/70 (2017.01); G06T 3/60 (2006.01); B60W 60/00 (2020.01); G06T 7/32 (2017.01);
U.S. Cl.
CPC ...
G06T 3/0068 (2013.01); B60W 60/001 (2020.02); G01S 13/89 (2013.01); G01S 13/931 (2013.01); G01S 17/89 (2013.01); G01S 17/931 (2020.01); G06T 3/60 (2013.01); G06T 7/32 (2017.01); G06T 7/70 (2017.01); B60W 2420/42 (2013.01); B60W 2420/52 (2013.01); G06T 2207/30252 (2013.01);
Abstract

A spatial monitoring system employs a partial dimension iterative closest point analysis to provide improved accuracy for point cloud registration. The partial dimension iterative closest point analysis improves registration accuracy by performing optimization in accordance with an error magnitude of each dimension, wherein dimensions having large initial errors are significantly improved, and dimensions having high initial accuracy are further improved. The registration separately optimizes each dimension using surfaces with contributing information for the optimized dimension.


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