The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 30, 2024
Filed:
Feb. 13, 2023
Applicant:
Mitsui Chemicals, Inc., Tokyo, JP;
Inventors:
Assignee:
MITSUI CHEMICALS, INC., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); C08G 61/08 (2006.01); C09D 165/00 (2006.01); G03F 7/09 (2006.01); G03F 7/16 (2006.01);
U.S. Cl.
CPC ...
G03F 7/11 (2013.01); C08G 61/08 (2013.01); C09D 165/00 (2013.01); G03F 7/094 (2013.01); G03F 7/168 (2013.01); C08G 2261/228 (2013.01); C08G 2261/3325 (2013.01); C08G 2261/418 (2013.01);
Abstract
A material for forming an underlayer film according to the present invention is a material for forming an underlayer film which is used to form a resist underlayer film used in a multi-layer resist process, the material including a cyclic olefin polymer which has a repeating structural unit [A] represented by Formula (1) and a repeating structural unit [B] represented by Formula (2), in which a molar ratio [A]/[B] of the structural unit [A] to the structural unit [B] in the cyclic olefin polymer is greater than or equal to 5/95 and less than or equal to 95/5.