The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 30, 2024

Filed:

Mar. 23, 2021
Applicant:

Illumina, Inc., San Diego, CA (US);

Inventors:

Timothy J. Merkel, Escondido, CA (US);

Ruibo Wang, San Diego, CA (US);

Daniel Wright, San Diego, CA (US);

Danny Yuan Chan, San Diego, CA (US);

Avishek Aiyar, San Diego, CA (US);

Tanmay Ghonge, San Diego, CA (US);

Neil Brahma, San Diego, CA (US);

Arthur Pitera, Encinitas, CA (US);

Assignee:

Illumina, Inc., San Diego, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); B29C 59/02 (2006.01); C09D 183/14 (2006.01); G03F 7/16 (2006.01); B29K 83/00 (2006.01); B29K 105/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); B29C 59/022 (2013.01); C09D 183/14 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); B29K 2083/00 (2013.01); B29K 2105/0002 (2013.01);
Abstract

An imprinting apparatus includes a silicon master and an anti-stick layer coating the silicon master. The silicon master includes a plurality of features positioned at an average pitch of less than about 425 nm, each of the plurality of features comprises a depression having an opening with its largest opening dimension being less than about 300 nm. The anti-stick layer includes a crosslinked silane polymer network.


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