The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 30, 2024

Filed:

Mar. 24, 2021
Applicant:

Seiko Epson Corporation, Toyko, JP;

Inventors:

Kiyoshi Nakamura, Matsumoto, JP;

Toru Saito, Yamagata, JP;

Toshiyuki Yoda, Matsumoto, JP;

Naoki Koike, Matsumoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09D 11/107 (2014.01); B41J 11/00 (2006.01); B41M 5/00 (2006.01); C09D 11/322 (2014.01); C09D 11/38 (2014.01);
U.S. Cl.
CPC ...
C09D 11/107 (2013.01); B41J 11/0021 (2021.01); B41M 5/0023 (2013.01); C09D 11/322 (2013.01); C09D 11/38 (2013.01);
Abstract

A radiation curable ink jet composition includes polymerizable compounds; and a photopolymerization initiator, the polymerizable compounds include a vinyl ether group-containing (meth)acrylate represented by the following general formula (I), a content of the vinyl ether group-containing (meth)acrylate with respect to a total mass of the radiation curable ink jet composition is 15 percent by mass or more, and the photopolymerization initiator includes ethyl (2,4,6-trimethylbenzoyl)phenylphosphinate.HC═CR—CO—OR—O—CH═CH—R  (I)In the above formula, Rrepresents a hydrogen atom or a methyl group, Rrepresents a divalent organic residue having 2 to 20 carbon atoms, and Rrepresents a hydrogen atom or a monovalent organic residue having 1 to 11 carbon atoms.


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