The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 30, 2024

Filed:

Nov. 12, 2019
Applicant:

Massachusetts Institute of Technology, Cambridge, MA (US);

Inventors:

Abhinav Rao, Springfield, OH (US);

Anastasios John Hart, Waban, MA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 64/135 (2017.01); B29C 64/268 (2017.01); B29C 64/40 (2017.01); B29C 71/00 (2006.01); B33Y 10/00 (2015.01); B33Y 40/20 (2020.01); B29K 105/00 (2006.01); B29K 105/24 (2006.01);
U.S. Cl.
CPC ...
B29C 64/135 (2017.08); B29C 64/268 (2017.08); B29C 64/40 (2017.08); B29C 71/0009 (2013.01); B33Y 10/00 (2014.12); B33Y 40/20 (2020.01); B29K 2105/0002 (2013.01); B29K 2105/243 (2013.01);
Abstract

Systems and methods for making it easier to remove support structures printed in conjunction with printing an object using stereolithographic additive manufacturing are disclosed. In some exemplary embodiments, one or more interfaces between the printed object and the support structures are modulated to allow for easy separation between them, in some instances even when the object and support structures are made from the same material. Various modulation techniques are disclosed, including adjusting an intensity of exposure to light at interfaces between the object and support structures, and using two materials where one material cures at two wavelength ranges and the other material only cures at one of the two wavelength ranges. Other systems and methods that allow for easy separation of part and support structure are also described.


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