The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 30, 2024
Filed:
Dec. 31, 2020
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, KR;
Inventors:
Youngchul Kwon, Asan-si, KR;
Manhee Han, Cheonan-si, KR;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S 3/23 (2006.01); G02B 19/00 (2006.01); H01L 21/67 (2006.01); H01L 21/683 (2006.01); B23K 26/53 (2014.01); H01L 21/78 (2006.01); B23K 26/0622 (2014.01); B23K 26/06 (2014.01); B23K 26/70 (2014.01); B23K 103/00 (2006.01); H01S 3/067 (2006.01);
U.S. Cl.
CPC ...
B23K 26/53 (2015.10); B23K 26/0624 (2015.10); B23K 26/0665 (2013.01); B23K 26/705 (2015.10); G02B 19/0009 (2013.01); G02B 19/0047 (2013.01); H01L 21/67115 (2013.01); H01L 21/78 (2013.01); H01S 3/2316 (2013.01); B23K 26/0648 (2013.01); B23K 2103/56 (2018.08); H01L 21/6836 (2013.01); H01L 2221/68327 (2013.01); H01S 3/067 (2013.01);
Abstract
A wafer processing apparatus includes: a laser apparatus configured to generate a laser beam; a focusing lens optical system configured to focus the laser beam on an inside of a wafer; an arbitrary wave generator configured to supply driving power to the laser apparatus; and a controller configured to control the arbitrary wave generator, wherein the laser beam includes a plurality of pulses sequentially emitted from the laser apparatus, and wherein each of the plurality of pulses is a non-Gaussian pulse, and a full width at half maximum (FWHM) of each of the plurality of pulses ranges from 1 ps to 500 ns.