The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 30, 2024
Filed:
Sep. 23, 2021
Applicant:
Unm Rainforest Innovations, Albuquerque, NM (US);
Inventors:
David G. Whitten, Albuquerque, NM (US);
Dylan Brown, Albuquerque, NM (US);
Jianzhong Yang, Albuquerque, NM (US);
Edward Strach, Albuquerque, NM (US);
Mohammed Khalil, Albuquerque, NM (US);
Assignee:
UNM Rainforest Innovations, Redmond, WA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A01N 43/10 (2006.01); A01N 25/34 (2006.01); A01N 43/50 (2006.01); A61L 2/08 (2006.01); C08G 61/12 (2006.01);
U.S. Cl.
CPC ...
A01N 43/10 (2013.01); A01N 25/34 (2013.01); A01N 43/50 (2013.01); A61L 2/08 (2013.01); C08G 61/126 (2013.01); A61L 2300/404 (2013.01); C08G 2261/143 (2013.01); C08G 2261/149 (2013.01); C08G 2261/224 (2013.01); C08G 2261/3223 (2013.01);
Abstract
The present disclosure provides an antimicrobial substrate including a substrate and a polythiophene polymer. The polythiophene polymer has a number of repeated monomer units from n is 5-14 or 30 to 120, a number average molecular weight (Mn) from 1,000 to 4,000 or 10,000 to 40,000; and a polydispersity index (PDI) from 1 to 1.3. The present disclosure also provides the polythiophene polymer and uses thereof.