The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 23, 2024

Filed:

Feb. 04, 2021
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Takahiro Yamada, Kyoto, JP;

Makoto Abe, Kyoto, JP;

Kazuhiko Fuse, Kyoto, JP;

Jun Watanabe, Kyoto, JP;

Shinji Miyawaki, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/265 (2006.01); H01L 21/324 (2006.01); H01L 21/687 (2006.01); H05B 3/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67115 (2013.01); H01L 21/265 (2013.01); H01L 21/324 (2013.01); H01L 21/67248 (2013.01); H01L 21/68757 (2013.01); H05B 3/0047 (2013.01);
Abstract

A ring support is attached to an inner wall surface of a chamber that houses a semiconductor wafer to support a susceptor. When the semiconductor wafer is placed on the susceptor, an inner space of the chamber is separated into an upper space and a lower space. Particles are likely to accumulate on a lower chamber window as a floor part of the chamber. However, since the upper space and the lower space are separated, the semiconductor wafer can be prevented from being contaminated by the particles flowing into the upper space and adhering to a surface of the semiconductor wafer even when the particles on the lower chamber window are blown up by irradiation with flash light.


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