The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 23, 2024
Filed:
Jan. 28, 2020
Applicant:
Dh Technologies Development Pte. Ltd., Singapore, SG;
Inventor:
James W Hager, Mississauga, CA;
Assignee:
DH Technologies Development Pte. Ltd., Singapore, SG;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 49/00 (2006.01); H01J 49/42 (2006.01); H01J 49/24 (2006.01); H01J 49/36 (2006.01);
U.S. Cl.
CPC ...
H01J 49/4215 (2013.01); H01J 49/0031 (2013.01); H01J 49/24 (2013.01); H01J 49/36 (2013.01);
Abstract
Methods and systems for FTMS-based analysis having an improved duty cycle relative to conventional FTMS techniques are provided herein. In various aspects, the methods and systems described herein operate on a continuous ion beam, thereby eliminating the relatively long duration trapping and cooling steps associated with Penning traps or orbitraps of conventional FTMS systems, as well as provide increased resolving power by sequentially interrogating the continuous ion beam under different radially-confining field conditions.