The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 23, 2024
Filed:
Oct. 18, 2021
Panasonic Intellectual Property Management Co., Ltd., Osaka, JP;
Toshihiro Wada, Osaka, JP;
Naoaki Takeda, Osaka, JP;
Abstract
A plasma processing apparatusincluding: a chamberhaving a dielectric window; a coilplaced outside the chamber so as to face the dielectric window; a FS electrodehaving a plate shape and placed on the chamber side of the coil; a first power sourcefor supplying a high-frequency power of a first frequency to the coil; a second power sourcefor supplying a high-frequency power of a second frequency which is different from the first frequency, to the FS electrode; a first matcherplaced between the first power source and the coil; a second matcherplaced between the second power source and the FS electrode; and a first frequency attenuation filter connected between the second matcher and the FS electrode, and configured to allow transmission of the high-frequency power of the second frequency and inhibit transmission of the high-frequency power of the first frequency.