The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 23, 2024

Filed:

Mar. 09, 2022
Applicant:

Kioxia Corporation, Tokyo, JP;

Inventors:

Manabu Sakaniwa, Fujisawa, JP;

Yasuhiro Shiino, Fujisawa, JP;

Kota Nishikawa, Sagamihara, JP;

Yu Ishiyama, Kawasaki, JP;

Shinji Suzuki, Sagamihara, JP;

Assignee:

KIOXIA CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11C 11/34 (2006.01); G11C 16/16 (2006.01); G11C 16/04 (2006.01); H10B 41/27 (2023.01); H10B 43/27 (2023.01);
U.S. Cl.
CPC ...
G11C 16/16 (2013.01); G11C 16/0483 (2013.01); H10B 41/27 (2023.02); H10B 43/27 (2023.02);
Abstract

A semiconductor memory device includes a substrate, gate electrodes, a semiconductor layer opposed to gate electrodes, an electric charge accumulating layer disposed between gate electrodes and the semiconductor layer, a conductive layer connected to one end portion of the semiconductor layer, and a control circuit electrically connected to gate electrodes and the conductive layer. Gate electrodes include first gate electrodes, second gate electrodes, and third gate electrode. The control circuit is configured to perform an erase operation. The erase operation includes: at least one-time first operation that applies a first voltage to the conductive layer; a second operation performed after the first operation, the second operation applying a second voltage to the third gate electrode; and at least one-time third operation performed after the second operation, the third operation applying a third voltage same as or larger than the first voltage to the conductive layer.


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