The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 23, 2024
Filed:
Oct. 19, 2020
Shanghaitech University, Shanghai, CN;
SHANGHAITECH UNIVERSITY, Shanghai, CN;
Abstract
A method of processing light field images for separating a transmitted layer from a reflection layer. The method comprises capturing a plurality of views at a plurality of viewpoints with different polarization angles; obtaining an initial disparity estimation for a first view using SIFT-flow, and warping the first view to a reference view; optimizing an objective function comprising a transmitted layer and a secondary layer using an Augmented Lagrange Multiplier (ALM) with Alternating Direction Minimizing (ADM) strategy; updating the disparity estimation for the first view; repeating the steps of optimizing the objective function and updating the disparity estimation until the change in the objective function between two consecutive iterations is below a threshold; and separating the transmitted layer and the secondary layer using the disparity estimation for the first view.