The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 23, 2024

Filed:

Nov. 05, 2020
Applicant:

Bank of America Corporation, Charlotte, NC (US);

Inventors:

Douglas James Goddard, McKinney, TX (US);

Sujit Kumar, Plano, TX (US);

Patrick Edward Neal, Frisco, TX (US);

Paul Eric Hazboun, Mound, TX (US);

Juvenita Sheela Jothi Santha Kumar, Carrollton, TX (US);

Ananth M. Padmanabhan, Wilmington, DE (US);

George Wesley Cleveland, Dallas, TX (US);

Assignee:

BANK OF AMERICA CORPORATION, Charlotte, NC (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 9/44 (2018.01); G06F 9/445 (2018.01); G06F 8/30 (2018.01);
U.S. Cl.
CPC ...
G06F 9/445 (2013.01); G06F 8/30 (2013.01);
Abstract

A system is provided for automatically generating electronic artifacts using extended functionality. In particular, the system may use a template-based process to automatically generate artifacts based on a defined set of parameters and/or variables. The system may further use one or more plugins which may provide extended functionality with respect to the artifact generation process. Accordingly, the artifact generation process may include initializing a parameter list based on application parameters and/or plugin parameters, processing the parameters, generating variables based on the parameters, and replacing variables in scheme template files with appropriate values (e.g., user supplied or plugin generated values) to output an artifact file to a predetermined location. In this way, the system provides a robust and efficient way to automatically generate artifacts.


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