The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 23, 2024

Filed:

Jul. 14, 2021
Applicant:

Meta Platforms Technologies, Llc, Menlo Park, CA (US);

Inventors:

Zachary Perlmutter, Seattle, WA (US);

Tingling Rao, Bellevue, WA (US);

Giuseppe Calafiore, Woodinville, WA (US);

Emily Anne Makoutz, Carnation, WA (US);

Assignee:

META PLATFORMS TECHNOLOGIES, LLC, Menlo Park, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 222/20 (2006.01); G03F 7/004 (2006.01);
U.S. Cl.
CPC ...
C08F 222/20 (2013.01); G03F 7/0046 (2013.01);
Abstract

Disclosed herein is a nanoimprint lithography (NIL) soft mold precursor material comprising a curable fluorinated base resin component, one or more additives, one or more crosslinkers, and one or more of a photo radical generator, a photo acid generator, or both. According to certain embodiments, further disclosed herein are a polymeric material comprising a partially or totally polymerized or crosslinked NIL precursor material, a NIL soft mold comprising the polymeric material, a process for making the NIL soft mold, and a method of using the NIL soft mold to form a NIL grating.


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