The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 23, 2024

Filed:

Dec. 14, 2020
Applicant:

Essilor International, Charenton-le-Pont, FR;

Inventors:

Peiqi Jiang, Dallas, TX (US);

Arnaud Glacet, Dallas, TX (US);

Zbigniew Tokarski, Dallas, TX (US);

Assignee:

Essilor International, Charenton-le-Pont, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29D 11/00 (2006.01);
U.S. Cl.
CPC ...
B29D 11/0048 (2013.01);
Abstract

The present disclosure includes systems, devices, and methods for preventing contamination during formation of an optical article. In some implementations, a device for preventing contamination of a mold cavity during injection molding of a function wafer includes a containment band having an annular base that defines a first opening configured to receive a functional wafer. The device also includes one or more sidewalls that project a first direction from and surround at least a portion of the first opening. The one or more sidewalls may be configured such that, during formation of an optical article, a first portion of the functional wafer is in contact with the one or more sidewalls.


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