The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 16, 2024

Filed:

Jan. 05, 2021
Applicant:

Richtek Technology Corporation, Zhubei, TW;

Inventors:

Chih-Feng Huang, Hsinchu, TW;

Lung-Sheng Lin, Taichung, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/07 (2006.01); H01L 29/739 (2006.01); H01L 29/66 (2006.01); H01L 21/8249 (2006.01); H01L 29/872 (2006.01);
U.S. Cl.
CPC ...
H01L 27/0722 (2013.01); H01L 21/8249 (2013.01); H01L 29/66136 (2013.01); H01L 29/66143 (2013.01); H01L 29/66325 (2013.01); H01L 29/7393 (2013.01); H01L 29/872 (2013.01);
Abstract

A power device which is formed on a semiconductor substrate includes: plural lateral insulated gate bipolar transistors (LIGBTs) and a forward conductive unit. The plural LIGBTs are connected in parallel to each other. The forward conductive unit is connected in parallel to the plural LIGBTs. The forward conductive unit consists of a PN diode and a Schottky diode connected in parallel to each other. The PN diode and the Schottky diode share a same N-type region, a reverse terminal, an N-type extension region, an field oxide region, a gate, and a P-type well in an epitaxial layer. The N-type region and the P-type well form a PN junction, wherein the PN junction has a staggered comb-teeth interface from top view. A metal line extends on the staggered comb-teeth interface and alternatingly contacts the N-type region and the P-type well.


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