The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 16, 2024

Filed:

Sep. 14, 2021
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Saumya Sharma, Easton, CT (US);

Ashim Dutta, Clifton Park, NY (US);

Tianji Zhou, Albany, NY (US);

Chih-Chao Yang, Glenmont, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 23/528 (2006.01); H01L 21/768 (2006.01); H01L 23/522 (2006.01); H10B 61/00 (2023.01); H10B 63/00 (2023.01);
U.S. Cl.
CPC ...
H01L 23/528 (2013.01); H01L 21/76816 (2013.01); H01L 21/76879 (2013.01); H01L 21/76843 (2013.01); H01L 23/5226 (2013.01); H10B 61/00 (2023.02); H10B 63/00 (2023.02);
Abstract

A semiconductor component includes an insulative layer having a lowermost surface arranged on top of a bottom dielectric material. The semiconductor component further includes a first interconnect structure arranged in the bottom dielectric material such that an uppermost surface of the first interconnect structure is arranged at a first height relative to the lowermost surface of the insulative layer. The semiconductor component further includes a pillar connected to the first interconnect structure and extending through the insulative layer. The semiconductor component further includes a second interconnect structure arranged in the bottom dielectric material such that an uppermost surface of the second interconnect structure is arranged at a second height relative to the lowermost surface of the insulative layer. The second height is different than the first height.


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