The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 16, 2024
Filed:
Dec. 17, 2021
International Business Machines Corporation, Armonk, NY (US);
Marc A. Bergendahl, Rensselaer, NY (US);
Christopher J. Penny, Saratoga Springs, NY (US);
James John Demarest, Rensselaer, NY (US);
Jean Wynne, Nassau, NY (US);
Christopher J. Waskiewicz, Rexford, NY (US);
Jonathan Fry, Fishkill, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Embodiments of the invention provide a method that includes forming an IC layer having an inactive region and an active region. The active region includes a device-under-fabrication (DUF). The inactive region includes a geometric feature having a geometric shape. A film is deposited over the active DUF and the geometric feature such that a first portion of the film will be part of the active DUF, and such that a second portion of the film is over the geometric feature. A geometric shape of the film over the geometric feature matches the geometric shape of the geometric feature. Determining a thickness of the film is based at least in part a difference between a footprint of the geometric shape of the film and a footprint of the geometric shape of the geometric feature.