The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 16, 2024

Filed:

Sep. 23, 2021
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventor:

Marvin Louis Bernt, Whitefish, MT (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/768 (2006.01); H01L 23/522 (2006.01); H01L 23/00 (2006.01); H01L 23/31 (2006.01); H01L 23/495 (2006.01); H01L 23/528 (2006.01); H01L 23/532 (2006.01); H01L 23/367 (2006.01); H01L 25/065 (2023.01); H01L 21/288 (2006.01);
U.S. Cl.
CPC ...
H01L 21/2885 (2013.01); H01L 21/76846 (2013.01); H01L 21/76873 (2013.01); H01L 21/76879 (2013.01); H01L 23/53238 (2013.01);
Abstract

A method of depositing a metal material on an isolated seed layer uses a barrier layer as a conductive path for plating. The method may include depositing a barrier layer on a substrate wherein the barrier layer provides adhesion for seed layer material and inhibits migration of the seed layer material, forming at least one isolated seed layer area on the barrier layer on the substrate, and depositing the metal material on the at least one isolated seed layer area using an electrochemical deposition process wherein the barrier layer provides a current path to deposit the metal material on the at least one isolated seed layer area.


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