The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 16, 2024

Filed:

Jul. 20, 2020
Applicants:

Agc Flat Glass North America, Inc., Alpharetta, GA (US);

Agc Glass Europe, Louvain-la-Neuve, BE;

Asahi Glass Co., Ltd., Tokyo, JP;

Inventors:

John Chambers, San Francisco, CA (US);

Peter Maschwitz, Sebastopol, CA (US);

Yuping Lin, Alpharetta, GA (US);

Herb Johnson, Kingsport, TN (US);

Assignees:

AGC FLAT GLASS NORTH AMERICA, INC., Alpharetta, GA (US);

AGC GLASS EUROPE, Louvain-la-Neuve, BE;

ASAHI GLASS CO., LTD., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C03C 17/245 (2006.01); C23C 16/50 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32559 (2013.01); C03C 17/245 (2013.01); C23C 16/50 (2013.01); H01J 37/32596 (2013.01); C03C 2218/153 (2013.01); H01J 2237/3321 (2013.01);
Abstract

The present invention relates generally to a plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction for deposition of thin film coatings and modification of surfaces. More particularly, the present invention relates to a plasma source comprising one or more plasma-generating electrodes, wherein a macro-particle reduction coating is deposited on at least a portion of the plasma-generating surfaces of the one or more electrodes to shield the plasma-generating surfaces of the electrodes from erosion by the produced plasma and to resist the formation of particulate matter, thus enhancing the performance and extending the service life of the plasma source.


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