The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 16, 2024
Filed:
Feb. 04, 2021
Applicant:
Lg Chem, Ltd., Seoul, KR;
Inventors:
Cheolock Song, Daejeon, KR;
Han Min Seo, Daejeon, KR;
Nam Seok Bae, Daejeon, KR;
Jinhong Kim, Daejeon, KR;
Minjun Gim, Daejeon, KR;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1339 (2006.01); G02B 5/30 (2006.01); G02F 1/1335 (2006.01); G02F 1/1347 (2006.01);
U.S. Cl.
CPC ...
G02F 1/1339 (2013.01); G02B 5/3016 (2013.01); G02F 1/1335 (2013.01); G02F 1/1347 (2013.01); G02F 2202/28 (2013.01);
Abstract
A pattern film, a transmittance variable device comprising the same, and a method for manufacturing a transmittance variable device are disclosed herein. In some embodiments, a pattern film includes a first base layer, and a spacer pattern formed on the first base layer, wherein the spacer pattern comprises a partition wall spacer and a ball spacer, wherein the ball spacer is one of embedded in, partially embedded in, or in contact with the partition wall spacer, and wherein an area of the spacer pattern per unit area of the first base layer is 5% or greater to 17% or less.