The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 16, 2024

Filed:

Jul. 26, 2021
Applicant:

Concept Laser Gmbh, Lichtenfels, DE;

Inventors:

Maik Zimmermann, Stegaurach, DE;

Florian Bechmann, Lichtenfels, DE;

Assignee:

Concept Laser GmbH, Lichtenfels, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02F 1/03 (2006.01); G02F 1/01 (2006.01); B33Y 30/00 (2015.01); B33Y 10/00 (2015.01); B23K 26/354 (2014.01); B29C 64/153 (2017.01); B29C 64/268 (2017.01); B22F 12/43 (2021.01); B22F 10/28 (2021.01); B28B 1/00 (2006.01); B23K 26/06 (2014.01); B23K 26/067 (2006.01); B23K 26/064 (2014.01); B23K 26/0622 (2014.01); B22F 12/49 (2021.01);
U.S. Cl.
CPC ...
G02F 1/0327 (2013.01); B22F 10/28 (2021.01); B22F 12/43 (2021.01); B23K 26/064 (2015.10); B23K 26/0604 (2013.01); B23K 26/067 (2013.01); B23K 26/0622 (2015.10); B23K 26/354 (2015.10); B28B 1/001 (2013.01); B29C 64/153 (2017.08); B29C 64/268 (2017.08); B33Y 10/00 (2014.12); B33Y 30/00 (2014.12); B22F 12/49 (2021.01); G02F 2202/06 (2013.01);
Abstract

An irradiation device for an additively manufacturing apparatus may include a working beam generation device configured to provide a working beam, a modulation beam generation device configured to provide a modulation beam, and a solid-state optical modulator that includes a crystalline material that exhibits a change in refractive index in response to photoexcitation of free electrons within the crystalline material. The irradiation device may include a power source coupled to the solid-state optical modulator and configured to introduce free electrons into the crystalline material. The modulation beam may cause photoexcitation of the free electrons within the crystalline material. The photoexcitation of the free electrons within the crystalline material may cause the crystalline material to exhibit a change in refractive index. The working beam, when incident upon the crystalline material, may exhibit a change in one or more parameters, such as a phase shift, attributable at least in part to the change in refractive index exhibited by the crystalline material.


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