The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 16, 2024
Filed:
Dec. 20, 2018
The Regents of the University of Michigan, Ann Arbor, MI (US);
Lingjie Jay Guo, Ann Arbor, MI (US);
Xi Chen, San Jose, CA (US);
THE REGENTS OF THE UNIVERSITY OF MICHIGAN, Ann Arbor, MI (US);
Abstract
A plasmonic device incorporating a special hyperbolic metamaterial (HMM) metamaterial is used for plasmonic lithography, including ultraviolet (UV) lithography. It may be a Type II HMM (ϵ<0 and ϵ>0) whose tangential component of the permittivity ϵis close to zero. Due to the high anisotropy of the Type II epsilon near zero (ENZ) HMM, only one plasmonic mode can propagate horizontally with low loss in a waveguide system with ENZ HMM as its core. In certain aspects, a Type II ENZ HMM comprises alternating layers of aluminum/aluminum oxide films and the associated unusual mode of light transmission is used to expose a photosensitive layer in a specially designed lithography system. Methods for making patterns of nanofeatures via such plasmonic lithography are also provided, including as a plasmonic roller device.